코리아바큠테크

KVP-2000L

KVP-2000 Seires

PLD VACUUM EQUIPMENTS

    PLD (Pulsed Laser Deposition) is a physical deposition method that utilizes a high energy
    focused laser. Conceptually and experimentally.

Overview

PLD (Pulsed Laser Deposition) is a physical deposition method that utilizes a high energy

focused laser. Conceptually and experimentally. PLD is extremely simple. It consists of a

target holder and a substrate holder housed in a vacuum chamber. A set of optical

components focus and raster a high-power laser (the external source) into a

concentrated beam over the target surface which vaporizes target materials to

ultimately deposite thin film.

 

 

Advantages

Allows for the use of various targets and for the in-situ deposition of multi-layers

Consists of simple hardware

Simple system maintenance

Various aspect of beam-target-substrate positioning

Temperature uniformity of substrate

Pyrometer Port

Laser strength measurement port

Ellipsometry port


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